SolaReactor™

AR Film and POCl3 Deposition Systems

Overview
 
Designed specifically for the solar industry, the SolaReactor™ deposits a dual refractive index PECVD AR film and low sheet resistance POCl3 deposition to produce highly efficient solar cells.

 The SolaReactor™ provides increased yields and superior reflective value films, compared with atmospheric TiNitride process. The SolarReactor™ deposits a dual refractive index nitride film using an included process to produce one of the most efficient AR coatings available. The POCl3 configuration controls the sheet resistance to a high degree of accuracy. 		 
  • Compact: floor space required is less than 4.2m² (45.9 ft²). Overall height 2.3m (90")
  • May be configured for left hand or right hand, stand-alone or through-wall installation
  • Each tube level microprocessor controlled for functional capability and ease of operation
  • HOST computer with with flat screen and keyboard/mouse controls (touch screen available).
  • POCl3 and PECVD processes available in the same system frame
  • Accommodates substrates up to 200mm diameter/diagonal — psuedo-square 156cm2
  • Large bore system available accommodates substrates up to 300mm diameter/diagonal
  • Processes either poly-crystalline or mono-crystalline substrates
  • Deposited/un-deposited substrate boats exchanged in <10 seconds
  • Incorporates proven technologies developed over the last 40 years in the semiconductor and solar industries
 
SolaReactor technical detail
More information on anti-reflective coatings
The POCL3 process
See system outline drawing (pdf)
Download PowerPoint presentation of features and benefits (588KB)
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Each SolarReactor™ system is capable of processing more than 20 MILLION finished POCl3 or over 10 MILLION finished PECVD substrates per year.
   Complete AR film deposition system features:
  • POCl3 & PECVD configuration capability
  • In-line load station
  • FasTemp™ low thermal mass heating elements
  • Gas cabinet with plumbing and MFC controlled gas systems
  • Independent s/s scavenger at each tube level (POCl3 configuration)
  • T/C Track™ thermocouple system
  • PC-based process/temperature control system with HOST computer with keyboard/mouse controls
    
    The PECVD gas cabinet encloses the process/temperature controls, RF generator controllers, vacuum valve controllers, gas systems and HOST computer.

 The system includes individual SCR power packs for each zone and redundant over-temperature system for each zone and cabinet temperature.

 These features are independent of the PC control system.		    
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